A model for magnetron sputter deposition using a rotating cylindrical magnetron k. With a rotating cylindrical magnetron, this compound layer is sputtered again after each target rotation, resulting in better process stability during reactive magnetron sputter deposition. Robust mechanical and electrical construction corrosion resistant and modular magnet bars optimized magnetics to maximize bulk target erosion and deposited film uniformity profiled magnetics to reduce the separation distance between adjacent racetracks. Film thickness distribution in magnetron sputtering s swarm, edwards high vacuum international, manor royal, crawley, w. Pdf extended magnetron sputter deposition system with a. Greene 2 1 ghent university, department of solid state sciences, krijgslaan 281 s1, 9000 ghent, belgium 2 materials science and physics departments and the frederick seitz materials research laboratory, university of illinois, urbana, illinois 61801, usa sputter deposition is a widely used technique to deposit thin films on substrates. Pdf cylindrical magnetron sputtering system for coating. Everyday we assist customers with magnet selection and design. Simulation of a magnetron using discrete modulated. The magnetron tube works on dc direct current power. Ctx series production magnetron sputtering sources in larger 3d coating applications the ctx series of cylindrical target magnetrons accomplishes the task in one easy step. We show that stress in sputterdeposited silicon nitride films can be controlled, making either compressive or tensile stress films achievable. Its working principle is based on the interaction between electron stream and magnetic field.
If k 1, the cavity terminals are at a voltage maximum in the input line at. Product was successfully added to your shopping cart. The main consideration of this thesis will be the glow discharge process, and in particular magnetron sputtering techniques will be examined in detail. Pic model of the magnetron for simulations we applied xoopic code verboncoeur et al. The model describes the sputtered particles trajectories through the gas in a user definable 3d setup. Sussex, uk of crucial importance to the thin film process engineer is an understanding of the parameters which affect the film. Satellite power system sps magnetron tube assessment. Spatial variations of plasma parameters have been studied in the cylindrical magnetron device using the radially movable langmuir probe. Sputter deposition processes connecting repositories.
The microwave radiation of microwave ovens and some radar applications is produced by a device called a magnetron the magnetron is called a crossedfield device in the industry because both magnetic and electric fields are employed in its operation, and they are produced in perpendicular directions so that they cross. Of course, the early devices by randall and boot were. A cylindrical target having a cylindrical backing tube and hollow cylindrical target material disposed on an outer circumference of the cylindrical backing tube. Davidson february, 1990 this research was supported in part by sdioist under the. Electrons pass by the openings to these cavities and cause microwaves to oscillate within, similar to the way a whistle produces a tone when excited by an air stream blown past its opening. The space between cathode and anode is called interaction space. Reactive rotatable cylindrical magnetron sputtering for. Reactive cylindrical magnetron deposition ofreactive. The applied magnetic field is constant and applied along.
The paper presents a method for determining a critical distance from the magnetron tube wall. Recent developments in inverted cylindrical magnetron sputtering. Center for advanced plasma surface technology magnetron. A 500 mhz stainless steel cavity, used instead of the usual copper cavity, allows the mounting of four sample holders and direct connection to a gas analyser. Angstrom sciences has developed cylindrical magnetron technology that embody. Isoflux is the world leader in inverted cylindrical magnetron icm sputtering.
The filament leads are large and rigid enough to keep the cathode and filament structure fixed in position. A dc cylindrical magnetron sputtering device is designed and its characteristics are studied. Robust mechanical and electrical construction corrosion resistant and modular magnet bars optimized magnetics to maximize bulk target erosion and deposited film uniformity profiled magnetics to reduce the separation distance between adjacent racetracks vapor phase efficiency. Coaxial cylindrical magnetron sputtering sources in which post or hollow cathodes are operated in axial magnetic fields have been reported for a number of years. This paper describes the operation of an inverted cylindrical magnetron consisting of two coaxial targets in a common magnetic field, as described by penfold and thornton. The cavity magnetron is the most compact, efficient source of highpower. Jns 3 20 443 451 deposition of alcu multilayer by double targets cylindrical dc magnetron sputtering system p. Microwave engineering kg reddy college of engineering. May 22, 2018 in this video, i have explained following topics regarding magnetron oscillator. Deposition of alcu multilayer by double targets cylindrical. A magnetic coil mounted around the outer cylinder generates an axial magnetic. Pvd products manufactures sputtering systems for depositing metal and dielectric thin films on substrates up to 300 mm in diameter. Cylindrical magnetrons have long been trusted in the glass coating industry to create uniform thin films while maximizing target utilization.
Construction and operation of a cylindrical magnetron sputtering system for coating glass tubes with solar selective surfaces is described. A monte carlo simulation of the metal flux from a small scale rotating cylindrical magnetron is presented. Isoflux is recognized as the worlds leading manufacturer of inverted cylindrical magnetron sputtering cathodes. The output of the magnetron is drawn from any one of the. If the apparatus has been stored at a temperature within the allowed storage range but outside the allowed operating range, it must be kept at an ambient temperature, within the allowed operating range, for at least 2 hours prior to turning the apparatus on. Main specifications of reactive sputtering in an inverted cylindrical magnetron icm 07042016 phd. Dec 18, 1979 placement of cylindrical magnets inside of a cylindrical cathode comprising a source of depositing material for sputter depositing of the material upon the interior surface of a substantially cylindrical workpiece, results in improved deposition rates, low power requirements, low workpiece temperatures and purity and cohesiveness in the deposited layer of material. Film thickness variation in a cylindrical magnetron deposition device.
A rotating cylindrical magnetron consists of a cylindrical tube, functioning as the cathode, which rotates around a stationary magnet assembly. Us4179351a us05721,740 us72174076a us4179351a us 4179351 a us4179351 a us 4179351a us 72174076 a us72174076 a us 72174076a us 4179351 a us4179351 a us 4179351a authority us united states prior art keywords cathode magnet magnetron sputtering means sputtering source prior art date 19760909 legal status the legal status is an assumption and is not a legal conclusion. The magnetron is a vacuum tube which is used in the generation of microwaves of high power. The cylindrical anode magnetron oscillates in the socalled cyclotron mode, as the result of a sinusoidal voltage built up between cathode and anode. Microwave phase shifter is a device designed to alter the phase of electromagnetic. Design, construction and characterisation of a variable.
Now, angstrom sciences has created a compact, lightweight, and economical cylindrical magnetron specifically designed to offer these same advantages to flat panel display, solar cell, and web coating applications. This popular technique forms the focus of this chapter. The calculation on the axis of symmetry is presented in every case. The great advance in magnetron design was the resonant cavity magnetron or electronresonance magnetron, which works on entirely different principles. Pdf film thickness variation in a cylindrical magnetron. Cylindrical magnetron sputtering source hewlettpackard company. Industrial magnetrons toshiba hokuto electronics corporation. Inverted cylindrical magnetron sputtering also known as hollow cathode magnetron sputtering has been in use for over 20 years. Pfcja905 computer simulation of relativistic multiresonator cylindrical magnetrons by heiwai chan chiping chen onald c.
The electric field is present radially while the magnetic field is present axially in the cavity magnetron. A method to increase deposition rate priya ramana center for plasma material interactions, university of illinois, urbana, illinois 61801 ivan a. The magnetron is classed as a diode because it has no grid. The cathode is in the center of the chamber or the cylinder. Pdf format this is an excellent, concise account of how. For magnets with cylindrical symmetry, we propose an approach based on an expansion in legendre polynomials to obtain the. The cathode and filament are at the center of the tube and are supported by the. Scheme of the region used for 2d pic model of discharge in cylindrical magnetron is depicted in. Sheridan department of physics and astronomy, the university of iowa, iowa city iowa 52242 received 4 september 1990. Nitinol thin film threedimensional devices fabrication and applications vikas gupta, a. The field distribution can be eliminated by combining eqs. This anode block is made of a number of slots that acts as resonant anode cavities. Magnetic field dependence of sputtering magnetron efficiency.
Among these is a process called sputtering that has. Satellite power system sps magnetron tube assessment study william c. They sputter from the surface of approximately cylindrical targets and can be built in either the post or inverted geometry to sputter off of the outside or inside of the target, respectively. Dual magnetron sputtering of aluminum and silicon oxides. The righthandside is a picture from the university of michigans relativistic magnetron whi054 figure 1. Combine effect of e and h when both fields are existing in that case the. This concept also resulted in faster startup times by combining different priming mechanisms. The anode has several cavities that open into interaction space.
Cavity magnetron depend upon the interaction of electrons with a rotating electromagnetic eld of constant angular velocity. First magnetron tube was invented in 1940 at englands university by john randall and harry boot. Complete patent searching database and patent data analytics services. The em magnetron method apparatus provide accurate results when the following conditions are met it is within its calibration cycle. Gs appliances ltd have always ready to support you with correct microwave spare parts and solution since its founding day. It is available from 50 mm dia to 150 mm dia and in different lengths. Us4179351a cylindrical magnetron sputtering source. It has been shown that it is miedzyinnymi a function of magnetic field and the hall parameter. In this design the oscillation is created by the physical shaping of the anode, rather. In addition to lower substrate heating with the use of dc power, the drp technique is a potential route to obtain higher deposition rates since each magnetron is sputtering with the duty cycle of the dms typically 80% as compared to sputtering 50% of the time when ac or bipolar dc is used.
Continuous wave magnetrons are used for plasma processing in the manufacture of semiconductors and in industrial dielectric heating applications. Cylindrical magnetron angstrom science cylindrical. B constant, where b was the intensity of the magnetic field. Physical construction of a magnetron the magnetron is classed as a diode because it has no grid. Angstrom sciences has created a compact, economical cylindrical magnetron specifically designed to offer cylindrical sputtering advantages to flat panel display, solar cell, and web coating applications. A model for magnetron sputter deposition using a rotating. Cylindrical magnetron sputtering cathodes are described in a series of patents by penfold and thornton issued in the mid1970s and were among the first magnetrons developed. Uniformity control for rotating cylindrical magnetrons. Cylindrical magnet assemblies home magmate magnetic assemblies cylindrical magnet assemblies these powerful cylindrical magnet assemblies are available in ceramic, alnico and rare earth magnet material with diameters ranging from 14 to 2. Voltage tunable magnetrons are used in sweep oscillators in telemetry and in missile applications. Optimization of magnetron sputterdeposition process of.
There are cylindrical cavities around the cathode and these are open along. The cavity magnetron is a highpowered vacuum tube that generates microwaves using the interaction of a stream of electrons with a magnetic field while moving past a series of open metal cavities cavity resonators. This report presents some of the main theoretical aspects of the problem, as they are en. Cavity magnetron or magnetron oscillator in microwave. Cylindrical rotating magnetron sputtering crms has attracted a great deal of attention as one possible solution to the critical problems of conventional magnetron sputtering with a planar type. A thick cylindrical cathode is present at the center and a cylindrical block of copper, is fixed axially, which acts as an anode. In stationary mode, the cylindrical magnetron behaves similar to a planar magnetron with respect to the influence of reactive gas addition to the plasma. The phasing of magnetrons the problem of operating a number of magnetrons in phase with each other is encountered whenever power greater than that produced by a single magnetron is desired, as in linear accelerators, or in high power radar equipments.
Shchelkanov center for plasma material interactions, university of illinois, urbana, illinois 61801 and national nuclear. A magnetron cathode sputtering apparatus including a pair of rotary cylindrical sputtering targets mounted in spaced parallel relation in an evacuable coating chamber and separate magnetic means located within said targets, the magnetic means being oriented relative to one another such that the material sputtered therefrom will be directed inwardly and downwardly at an acute angle whereby the. Langmuir probe diagnostics of dc cylindrical magnetron. It was found that oscillation occurred following the relation. Charles university in prague, faculty of mathematics and physics, prague, czech republic. A magnetron system is used to control the direction of the tini material being sputtered and also to. There are cylindrical cavities around the cathode and these are open along their length and connect the common cavity space. Magnetron sputtering technology basic sputtering process there are many different ways to deposit materials such as metals, ceramics, and plastics onto a surface substrate and to form a thin film. Finally a modified version of the calcium barrier test method is presented, which enables an easier implementation of the barrier measurements in a production environment. Fixed frequency, cw magnetrons are used for industrial heating and microwave ovens. It exhibits several important advantages over other vacuum coating. Us6787011b2 cylindrical target and its production method. Thickness and composition uniformity, desired film properties.
The target can be powered in different ways, ranging from dc for conductive targets, to rf for non. Cylindrical magnetrons with rotating cathodes have found wide application in the thinfilm coating deposition technologies owing to a higher degree of the target utilization and used power level as compared with planar magnetrons. Niobium films produced by magnetron sputtering using an ar. Pdf the operation of any magnetrontype sputtering system is based on using of anomalous glow discharge in a crossed b e.
Crossed electron and magnetic fields are used in the magnetron to produce the highpower output required in radar equipment. Cylindrical magnetron presentations to view a presentations pdf listed below click on the pdf icon or the title of the file. Magnetic field dependence of sputtering magnetron efficiency j. Stability properties of the extraordinary mode perturbations in relativistic electron flow in a cylindrical magnetron are investigated within the framework of the macroscopic cold fluid model. Ac reactive sputtering with inverted cylindrical magnetrons. The cv64 cavity magnetron, developed in birmingham in 1942, was small. The design and construction of a functional and robust variable balance magnetron sputtering system. The aim of this work was to increase the efficiency of cylindrical magnetrons. Arnell centre for advanced materials and surface engineering, university of salford, salford m5 4wt, uk received 20 september 1999 abstract magnetron sputtering has become the process of choice for the deposition of a wide range of industrially important. Microwave engineering magnetrons unlike the tubes discussed so far, magnetrons are the crossfield tubes in which the electric and magnetic fields cross, i. Improvement of coating deposition and target erosion uniformity in rotating cylindrical magnetrons article pdf available in laser and particle beams 2102. Ultimately it depends on your application, but there are a lot of reasons to consider an icm.
The space present between the anode and cathode is called as interaction space. The device consists of two copper cylinders with 1. Film thickness distribution in magnetron sputtering. Keyholes magnetron design and multiphysics simulation. Optimization of magnetron sputterdeposition process of thin. Electronic theory of the cylindrical magnetron sciencedirect. A free powerpoint ppt presentation displayed as a flash slide show on id. But think of a tv set and a flute sort of merged together to produce microwaves. Design and fabrication of a dc cylindrical magnetron. Magnetronintroduction, construction, working, operation, applications. The ejection positions of the sputtered particles are generated according to the simulated ion current density on the target. The metal flux from a rotating cylindrical magnetron.
This paper describes the design of an xband magnetron to linear accelerator linac high power transfer system consisting in an 8 resonant cavities magnetron connected to a dedicated vacuum. With the sputtered flux arriving from the inner surface of the cylindrical target, this special source keeps the entire substrate surface in the plasma throughout the deposition for highly uniform film properties. This is the right place for you to get proper microwave oven spare parts for your microwave oven and industrial microwave equipment. Coating was performed in a cylindrical magnetron sputtering system as shown in fig. Electron path in a cylindrical magnetron 5 with a smooth anode. Standard static characteristics of cylindrical magnetrons. Applications of magnetron pulsed radar is the single most important application with large pulse powers. Therefore, combining power flux densities of phasecoherent sources. Magnetron sputtering is a highrate vacuum coat ing technique for depositing metals, alloys and compounds onto a wide range of materials with thicknesses up to about 5pm. Depla 1 1 ugent, gent, belgium 2 vito, mol, belgium. The sputtering target is the inner surface of a cylinder and the substrate is.
The first section will discuss methods and results for tuning a rotatable cylindrical magnetron in order to meet a uniformity specification the 2 nd section will discuss some of the criteria which should be understood prior to implementing a rotating cylindrical magnetron. Pdf improvement of coating deposition and target erosion. The magnetron heater must be protected against arcing by the use of a minimum capacitance of 4000 pf shunted across the heater directly at the input terminals. Improvement of coating deposition and target erosion.
They sputter from the surface of approximately cylindrical targets and can be built in either the post or inverted geometry to sputter off of the outside or inside of the. Now, angstrom sciences has created a compact, lightweight, and economical cylindrical magnetron specifically designed to offer these same advantages to flat panel display, solar cell, and web coating. Placement of cylindrical magnets inside of a cylindrical cathode comprising a source of depositing material for sputter depositing of the material upon the interior surface of a substantially cylindrical workpiece, results in improved deposition rates, low power requirements, low workpiece temperatures and purity and cohesiveness in the deposited layer of material. An array of magnetron sputtering sources, using rf, dc, or pulsed dc power, are operated singly or in codeposition mode to. Po2049 long cylindrical magnetron with dynamic magnetic field. Bore well magnets is a cylindrical magnet having a hook on one side and magnetic power on the other side. The cathode and filament are at the center of the tube and are supported by the filament leads. A metal carbide on copper selective surface produced in the coater is discussed in terms of uniformity of. Dual cylindrical target magnetron with multiple anodes. Magnetron oscillator cavity magnetron internal structure 3. The anode of a magnetron is fabricated into a cylindrical solid copper block. Brown raytheon company waltham, massachusetts prepared for marshall space flight center under contract nas833157 nlsa national aeronautics and space administration scientific and technical information branch 1981. Shorter magnetron s dimensions are given in figure 2. We offer several standard cathode designs and can also deliver customized designs to fit specific coating needs.
With decades experiences in microwave spare parts service, we have established extensive relationship with leading microwave part. The eigenvalue equations for the extraordinary mode waves are obtained. Pdf extended unbalanced magnetron sputter deposition system based on the cylindrical magnetron with a rotating cathode was developed. The need to make products smaller, less expensive, and still meet the magnetic field requirements has lead to our ability to micro machine many shapes and sizes, as well as set up assembly lines that mean repeatability and ramp up as needed. Let us define e wrt 14 electronic theory of the cylindrical magnetron 151 we obtain which is allid3 eq. Recent developments in inverted cylindrical magnetron.
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